CVD single crystal diamond

CVD single-crystal diamond usually uses methane and hydrogen as precursors, under high temperature (about 1000 ° C), atmospheric pressure (1 atmospheric pressure) or low pressure conditions, with single-crystal diamond substrate as the substrate, to grow single-crystal diamond in the way of gas phase epitaxial, the single-crystal diamond substrate used can be natural diamond, HPHT diamond or CVD diamond. This method can prepare diamond single crystals with higher purity and larger size, which has high use value. At the same time, with the progress of technology, the size of industrial production can also be gradually expanded, the application value continues to increase, and the application field is further expanded. In the future, it is expected to be widely used in ultra-precision tools, optics, semiconductors, electronic devices, lasers, missiles, aerospace and other fields.