CVD Single crystal diamond flakes

CVD single crystal diamond is typically grown using methane and hydrogen as precursors under high temperature (approximately 1000°C), atmospheric pressure (1 atm), or low-pressure conditions. The growth occurs via vapor-phase epitaxy on a single crystal diamond substrate, which can be natural diamond, HPHT diamond, or CVD diamond. This method enables the production of high-purity, large-size diamond single crystals with significant practical value. With technological advancements, the size suitable for industrial production is gradually increasing, enhancing its application value and expanding its use in various fields. In the future, it is expected to be widely applied in ultra-precision cutting tools, optics, semiconductors, electronic devices, lasers, missiles, aerospace, and more.